Datos del Documento

Por favor, use este identificador para citar o enlazar este documento: https://ria.asturias.es/RIA/handle/123456789/14607
Registro de Metadatos Completo
Campo Dublin Core Valor Idioma
dc.contributor.authorFernández Piedra, Helena-
dc.contributor.authorPlaza Martínez, Manuel-
dc.identifier.citationChem. Sci., 2023,14, 650-657es_ES
dc.description.abstractThe combination of photochemistry and halogen bonding interactions has risen in the last few years as a powerful synthetic tool for the creation of radical intermediates under mild conditions. In the formation of carbon-centered radicals, this reactivity has been to date restricted to the employment of aryl and alkyl halides as precursors. We now envisioned that the halogen-bonding initiated formation of highly reactive vinyl radicals would be a feasible process for the photochemical cross-coupling between thiols and alkenyl halides under basic conditions. The reaction shows indeed a very broad functional group tolerance, is stereoselective, simple and scalable. In-depth mechanistic studies point at the formation of vinyl and sulfur-centered radicals as the intermediates of the reaction and DFT calculations support the pre-formation of a halogen-bonding complex as the initiator of the photochemical transformation. Synthetic applications were developed to extend the utility of this methodology.es_ES
dc.description.sponsorshipFICYT (Principado de Asturias) “Margarita Salas Joven” ayudas postdoctorales Manuel Plaza (Referencia: AYUD/2021/58397)es_ES
dc.publisherRoyal Society of Chemistryes_ES
dc.subjectQuímica Orgánicaes_ES
dc.titlePhotochemical halogen-bonding assisted generation of vinyl and sulfur-centered radicals: stereoselective catalyst-free C(sp2)–S bond forming reactionses_ES
Aparece en las colecciones: Química

Archivos en este documento:
Fichero Tamaño Formato  
Chemical Science 2023 Manuel Plaza postprint.pdf1.24 MBAdobe PDFVer/Abrir
Mostrar el registro Básico

Ver estadísticas del documento

Todos los documentos en RIA están protegidos por derechos de autor.